PPMS
 
   


 
"METAL-POLYMER NANOCOMPOSITES OBTAINED BY COMBINED PLASMA TEHNIQUES"
TE_229
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Stage II. Investigation of species present in polymerization plasma (PECVD) and in magnetron sputtering plasma (PVD); Synthesis, by means of sequential PECVD/PVD deposition, of metal-polymer nanocomposites materials with controlled surface plasmon resonance frequency, using various metals

 

Representative images associated to the results obtained in the second stage of TE_229 project:

Schematic of the experimental set-up for the synthesis of metal-polymer composites and plasma diagnostics

# Experimental set-up for the metal-polymer composite consists in a stainless steel vacuum chamber provided with a magnetron sputtering source and a PECVD plasma source;
# The sources are mounted perpendicular one to each other, and respectively at 45 degrees in respect to the substrate;
# The setup allows the sequential or simultaneous substrate exposure to the PVD plasma source and to the PECVD plasma source;
# The system includes mounting on perpendicular port of mass spectrometer head, Langmuir probes and optical fiber slots for Optical Emission Spectroscopy.

 

# Topographical and morphological investigations of the copper-polythiophene reveal the formation of core-shell type structures consisting of nanometer sized Cu nanoparticles coated with a thin polythiohene layer.
# Spectroscopic ellipsometry measurements followed by model fiting of the Cu-PPTh composites show a strong absorption peak around 740 nm, associated with the surface plasmon resonance effect due to the presence of Cu nanoparticles in the plasma polymer matrix

 

# Typical MS spectrum of the Ar/C4H4S mixture presents the expected cracking pattern of the thiophene inside the mass spectrometer with major peaks corresponding to C4H4S (84 amu), C2H2S (58 amu) and CHS (45 amu),
the Ar – related peaks at 40 and 20 amu Ar neutrals; once the plasma is ignited, the appearance of completely new formed species, as CS2 at 76 amu is obvious;
# The mass spectra signal of ions associated to the masses higher than that of thiophene (C2H3S2+ (91 amu), C4H4S2+ (116 amu), etc).proves oligomerization reactions in the plasma volume;
# Monomer depletion was calculated for the prominent mass signals; a sharp increase of the monomer depletion immediately upon plasma ignition (1-3 W) and a much slighter

 

Dependence of the Ar and Cu abundances in the mass spectra as function of the applied RF power masses

# Ar peak (40 amu) and Cu peaks (63 and 65 amu) dominated the mass spectra of the plasma generated by the magnetron plasma source;
# Ar neutrals present a maximum intensity around 100 W applied RF power;
# Cu neutrals show a maximum intensity around 110 W applied RF.

 

 

 

 
             
Plasma Processes, Materials and Surfaces Group